Electron Imaging Center for Nanosystems

EICN provides advanced electron imaging tools for applications ranging from materials science to structural biology

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Description: The JEOL JSM-6610 SEM is an analytical Scanning Electron Microscope capable of achieving 3 nm point-to-point resolution at an accelerating voltage of 30 kV. It is equipped with a tungsten filament, and a large imaging chamber for observation of specimens ranging from small pieces up to 200 mm in diameter.

With Nanometer Pattern Generation System (NPGS) software, the system is capable of Electron Beam Lithography.

Key features:

  • Model: JEOL JSM-6610 SEM
  • Large sample size: up to 200 mm diameter and 80 mm height
  • Everhart-Thornley detector: 3.0 nm (30 kV), 15 nm (1 kV)
  • Magnification: 5x to 300,000x
  • Accelerating voltage: 1 kV to 30 kV
  • Filament: Tungsten hairpin
  • Equipped with Nanometer Pattern Generation System (NPGS) for Electron Beam Lithography

Instructions to become a user can be found here: EICN Become a User. Training can be requested by emailing eicnhelp@cnsi.ucla.edu. If you do not receive a reply within 48 hours, you can email Matthew Mecklenburg (mmecklenburg@cnsi.ucla.edu) to follow up.

Internal Academia rate: $50/hour; External Academia rate: $70/hour; Industry rate: $100/hour